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[GDMS] Glow Discharge Mass Spectrometry

Dissociate and fragment specific mass ions, and detect them with a mass spectrometer.

GDMS is a method for analyzing the composition of solid samples, allowing simultaneous analysis from major components to trace elements, and performing semi-quantitative analysis of impurities present in the sample. The concentration conversion uses the relative sensitivity factor (RSF) associated with the device. The analytical values are derived from the ion intensities of the major component elements and the target elements, calculated using the RSF, resulting in semi-quantitative values. - Bulk analysis is possible from trace elements (ppb level) to major component levels. - Depth profile analysis on the order of micrometers and thin film analysis are possible. - By using conductive materials and auxiliary electrodes, analysis of semiconductor materials and insulating materials is also possible. - High mass resolution allows for the removal of interfering ions. - Measurement is possible for almost all elements below Li, excluding hydrogen and noble gases. - Isotope ratio measurement is possible.

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Glow Discharge Mass Spectrometer "ELEMENT GD Plus"

Simple analysis of the composition and distribution of main components and trace elements in materials.

Glow Discharge Mass Spectrometry (GD-MS) is a system that samples and analyzes elements on the surface of solid samples using argon plasma. The ELEMENT GD Plus GD-MS employs a high-pressure glow discharge ion source that allows for switching between continuous and pulsed discharge, achieving both speed and flexibility in analysis. ■ Rapid analysis of elemental composition in solid materials - Simultaneous analysis of over 70 elements - A 12-digit dynamic range covering from sub-ppb levels, which are difficult to detect with XRF or OES, to major components - Semi-quantitative analysis without the need for standard samples. Precise quantification is also possible with the use of standard samples - High throughput: Rapid sampling and vacuum evacuation of high-pressure glow discharge allow for analysis in about 10 minutes per sample, including sample exchange ■ Compatibility with a wide range of materials and elements - Rapid analysis of metals and semiconductor materials. Non-conductive ceramics can also be analyzed using pulsed discharge and secondary electrodes - High-sensitivity analysis of C, N, and O with a newly developed ion source option - High-sensitivity analysis of low melting point elements Ga, In, and Te using pulsed discharge and cooling mechanisms ■ Multi-element simultaneous analysis with a wide dynamic range for depth profiling Supports rapid analysis from nm-order thin films using pulsed discharge to depth profiling up to 100 µm, which would take a long time with SIMS.

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